Russia is now preparing to put its first domestically-developed mass-produced photolithography machine into commercial operation, marking a significant milestone in the country's re-establishment of its domestic semiconductor equipment industry. The first mass-produced "Progress STP-350" is scheduled to be delivered to Mapper Company in Moscow in December 2026. The second machine is planned to be delivered to "Industry Solutions" of the Element Group.

The Zelenograd Nanotechnology Center (ZNTC) has collaborated with the Belarusian company Planar to develop a new system for semiconductor production at the 350-nanometer process node. Although the 350-nanometer process is not as advanced as current semiconductor processes, it is still crucial for various industrial electronic products, power devices, automotive components, and specialized sensors.

The first mass-produced models are being delivered to Russian customers

The equipment scheduled for delivery in December is not just the arrival of another factory equipment. Its purpose is to demonstrate that Russia has completed the transition from laboratory research to the mass production of photolithography systems.

Mapper is the first customer, affiliated with the Russian National Technical Group (Rostec), and is associated with the company through the Shvabe Holding Company. Industry Solutions of the Element Group plans to receive the second set of mass production systems. Therefore, these two sets of systems will be integrated into enterprises related to Russia's domestic microelectronics ecosystem.

According to Russian media on September 11, 2026, the basic version of the Progress STP-350 costs approximately 392 million rubles (excluding VAT). The version including a five-year warranty and extended service support costs approximately 561 million rubles. It is reported that the production cycle is approximately 18 months.

In addition, the machine has been registered in the Russian National Industrial Equipment Register with the number RAVC.442174.002TU, which may give it an advantage in the procurement process of state-owned enterprises.

350-nanometer stepping photolithography machine with 200-millimeter wafer processing capability

The Progress STP-350 is a projection stepping photolithography machine that transfers patterns on the photomask to the semiconductor substrate. The exposure area size is 22 mm x 22 mm, and the process resolution is 350 nanometers.

This equipment is more suitable for mature node semiconductor manufacturing rather than advanced logic device production, as it can handle wafers with a diameter of up to 200 millimeters.

Compared to traditional mercury lamps, using a solid-state laser as the light source is one of its most notable features. As shown in the provided specification parameters, this method aims to improve energy efficiency and provide greater power.

It is reported that the capacity of this equipment can reach 63 150-millimeter wafers per hour, while the production capacity using 200-millimeter wafers is approximately 43 wafers per hour. These data are significant because photolithography equipment must be able to maintain high resolution while providing sufficient production capacity to effectively carry out mass production.

This makes this technology of great strategic significance to Russia, as the country's demand for mature process semiconductor components exceeds that for smartphone processors and advanced computing chips. Industrial equipment, vehicles, energy systems, sensors, control electronic devices, and defense-related systems all require a large number of mature process semiconductor components.

It is reported that the first customer will operate a cleanroom facility covering approximately 1,500 square meters, with an annual processing capacity of 5,000 semiconductors, and participate in a project of the Russian Ministry of Industry and Trade, which focuses on the batch production of infrared detectors. This provides a potential direct application prospect for this new lithography technology.

Russia seeks to bridge the gap in key equipment

As the lithography technology combines precision optical components, lighting systems, mechanical positioning, control electronic devices, and specialized software, it is one of the most challenging domestic replication technologies in semiconductor manufacturing.

For decades, the global market has been dominated by a few companies from certain countries. Lithography systems covering mature and more advanced semiconductor processes are mainly provided by Japanese companies Canon and Nikon, Dutch company ASML, and an increasing number of Chinese equipment manufacturers.

For example, the i-line system produced by Canon operates at a wavelength of 365 nanometers and is suitable for LED manufacturing and MEMS applications. Nikon also provides mature stepping lithography systems, while ASML provides equipment for large-scale semiconductor manufacturing. Meanwhile, Chinese manufacturers have been developing and commercializing systems specifically designed for power electronic applications, involving materials such as gallium nitride and silicon carbide.

Given this, the launch of the Progress STP-350 provides Russia with a strategic domestic alternative for lithography equipment, although it is not at the technological forefront.

The larger goal is 130 nanometers

Therefore, the 350-nanometer machine should be understood as a stage in a broader technology roadmap rather than the ultimate goal.

Russia has announced that the next generation of domestic lithography systems is expected to be put into use in 2027, and this system is capable of producing 130-nanometer chips. Transitioning from 350 nanometers to 130 nanometers will significantly expand the range of semiconductor applications that Russia can develop domestically.

This transition will also assess the potential of the Russia-Belarus development partnership to expand capabilities in manufacturing, precision machinery, optics, and exposure systems.

However, semiconductor self-sufficiency does not merely start with the production of the smallest transistors. It also depends on whether reliable domestic equipment can be obtained to produce a wide variety of mature process node processors, which are crucial for industrial electronics, power systems, vehicles, and factory operations. The Progress STP-350 is designed to address this aspect of the semiconductor supply chain. The 130-nanometer process equipment under development indicates that Russia views it as the beginning of a broader lithography plan, rather than the end.